Photoelastic strain measurement in GaP (100) wafers under external stresses

被引:3
|
作者
Fukuzawa, M. [1 ]
Yamada, M. [1 ]
机构
[1] Kyoto Inst Technol, Grad Sch Sci & Technol, Sakyo Ku, Kyoto 6068585, Japan
关键词
D O I
10.1007/s10854-008-9651-z
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The sign of the absolute value of residual strain measured in LEC-grown GaP wafers with scanning infrared polariscope (SIRP) has been determined by measuring the residual strain in the round-shape wafer with and without compressive load to the diametric edges. Since the external stress induced by the compressive load is additive to the residual strain in wafer, the residual strain measured in the wafer with the compressive load is increased if the sign is negative while it is decreased if the sign is positive. The measurement of residual strain was successively performed in various LEC-grown GaP (100) wafers clamped their diametric edges in a specially-made vise, in which a movable jaw is pulled by a coil spring to slide parallel toward a fixed jaw with a compressive load. It is found from their results that the residual strain component of (S-r - S-t), where S-r is the radial strain component and S-t is the tangential strain component defined in the cylindrical coordinate system matching to the round-shape wafer, is negative; that is, radially compressive in most wafers.
引用
收藏
页码:S83 / S86
页数:4
相关论文
共 50 条
  • [1] Photoelastic strain measurement in GaP (100) wafers under external stresses
    M. Fukuzawa
    M. Yamada
    Journal of Materials Science: Materials in Electronics, 2008, 19 : 83 - 86
  • [2] Vicinal Si(100) surfaces under external strain
    Cho, K
    Joannopoulos, JD
    Berker, AN
    PHYSICAL REVIEW B, 1996, 53 (03): : 1002 - 1005
  • [3] Photoelastic characterization of residual strain in MWA SI InP crystal wafers
    Fukuzawa, M
    Herms, M
    Uchida, M
    Oda, O
    Yamada, M
    1998 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS - CONFERENCE PROCEEDINGS, 1998, : 537 - 540
  • [4] PHOTOELASTIC MEASUREMENT OF RECOVERABLE STRAIN AT 4 SITES
    BROWN, A
    TECTONOPHYSICS, 1974, 21 (1-2) : 135 - 164
  • [5] Residual strain measurement using photoelastic coatings
    Corby, TW
    Nickola, WE
    OPTICS AND LASERS IN ENGINEERING, 1997, 27 (01) : 111 - 123
  • [6] Photoelastic characterization of residual strain in GaAs wafers annealed in holders of different geometry
    Herms, M
    Fukuzawa, M
    Yamada, M
    Klöber, J
    Zychowitz, G
    Niklas, JR
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1999, 66 (1-3): : 7 - 10
  • [7] Photoelastic characterization of residual strain in GaAs wafers annealed in holders of different geometry
    Kyoto Institute of Technology, Dept. of Electronics and Info. Sci., Sakyo-ku, Kyoto 606-8585, Japan
    不详
    不详
    Mater Sci Eng B Solid State Adv Technol, 1 (7-10):
  • [8] QUANTITATIVE MEASUREMENT OF THE ULTRASONIC STRESSES IN A TRANSPARENT SOLID BY THE PHOTOELASTIC METHOD
    张守玉
    王丽生
    ChineseJournalofAcoustics, 1983, (02) : 97 - 106
  • [9] MEASUREMENT OF STRESSES IN SILICON WAFER WITH INFRARED PHOTOELASTIC METHOD.
    Qin, Ganming
    Liang, Hancheng
    Zhao, Shounan
    Yin, Honghui
    Hongwai Yanjiu, A-ji/Chinese Journal of Infrared Research A, 1988, 7 A (02): : 109 - 112
  • [10] COMPARISON OF RESULTS OF STRESSES IN TEETH BY PHOTOELASTIC AND STRAIN-GAUGE METHODS
    ADACHI, M
    YAMADA, M
    KISHIDA, K
    MISHIRO, K
    JOURNAL OF DENTAL RESEARCH, 1962, 41 (04) : 735 - &