Quantitative x-ray photoelectron spectroscopy study of Al/AlOx bilayers

被引：11
|
作者：
Batlle, X
Hattink, BJ
Labarta, A
Åkerman, JJ
Escudero, R
Schuller, IK
机构：
[1] Univ Barcelona, Dept Fis Fonamental, E-08028 Barcelona, Catalonia, Spain
[2] Univ Calif San Diego, Dept Phys, La Jolla, CA 92093 USA
[3] Univ Nacl Autonoma Mexico, IIM, Mexico City, DF, Mexico
来源：
JOURNAL OF APPLIED PHYSICS | 2002年 / 91卷 / 12期
关键词：
D O I：
10.1063/1.1478791
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
An x-ray photoelectron spectroscopy (XPS) analysis of Nb/Al wedge bilayers, oxidized by both plasma and natural oxidation, is reported. The main goal is to show that the oxidation state-i.e., O:(oxidize)Al ratio-, structure and thickness of the surface oxide layer, as well as the thickness of the metallic Al leftover, as functions of the oxidation procedure, can be quantitatively evaluated from the XPS spectra. This is relevant to the detailed characterization of the insulating barriers in (magnetic) tunnel junctions. (C) 2002 American Institute of Physics.
引用
收藏
页码：10163 / 10168
页数：6
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