Study on Vanadium Coating on Beryllium Substrate Prepared by Magnetron-Sputtering Method

被引：0

作者：

Qin Jianwei ^{[1
]}

Shuai Maobing ^{[1
]}

Chen Lin ^{[1
]}

Yang Weicai ^{[1
]}

机构：

[1] Natl Key Lab Surface Phys & Chem, Mianyang 621907, Peoples R China

来源：

RARE METAL MATERIALS AND ENGINEERING | 2012年 / 41卷

关键词：

beryllium; vanadium coating; magnetron sputtering; hot isostatic pressing;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Vanadium coating was prepared on beryllium by magnetron sputtering method, and SEM, XRD and AFM were employed to characterize the vanadium coating. The prepared coating was treated by hot isostatic pressing(HIP) in order to study the diffusion between beryllium and vanadium. The results show that pure and dense vanadium coating with good adherence to the substrate can be obtained when the partial pressure of Ar is 0.3 Pa and the power of the target is 2 kW at circle bias voltage ranging from -300 V to -800 V. The grains of vanadium crystal grow as column perpendicular to the substrate plane with a size of 175 nm. After hot isostatic pressing process, diffusion between beryllium and vanadium takes place with a diffusion layer of about 1 mu m in thickness and intermetallic phase of Be12V is formed.

引用

页码：754 / 756

页数：3

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