Complex Polarizability of an Isolated Subwavelength Plasmonic Hole in a Thin Metal Film

被引:0
|
作者
Xu, Jun [1 ]
Fang, Nicholas Xuanlai [1 ]
机构
[1] MIT, Dept Mech Engn, Cambridge, MA 02139 USA
关键词
OPTICAL-TRANSMISSION; APERTURES; DIFFRACTION; ARRAYS; PHASE; SLITS;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Because of the ability to concentrate light into subwavelength dimensions, plasmonic nanostructures have become a new frontier of nano-photonics, with promising applications for energy transport and conversion. In this work, we experimentally measure the near field intensity distribution of light squeezed through a subwavelength plasmonic hole in a thin metal film. Both transmission coefficient and phase shift of an in-plane electric dipole moment, which is excited near the isolated subwavelength hole, are retrieved based on the interference model of a plane and spherical wave. Strong transmission enhancement is achieved through the subwavelength hole due to the surface plasmon resonance via a model which is not predicted by the classical theory. The opposite phases of the excited dipoles in the subwavelength dent and protrusion are observed.
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页数:2
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