45nm node integration of low-k and ULK porous dielectrics

被引：0
|
作者：
van den Hoek, WGM [1 ]
机构：
[1] Novellus Syst Inc, San Jose, CA 95134 USA
来源：
SOLID STATE TECHNOLOGY | 2005年 / 48卷 / 11期
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D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：28 / +
页数：2
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