Measurement of collector-base junction avalanche multiplication effects in advanced UHV/CVD SiGe HBT's

被引:42
|
作者
Niu, GF [1 ]
Cressler, JD
Zhang, SM
Gogineni, U
Ahlgren, DC
机构
[1] Auburn Univ, Alabama Microelect Sci & Technol Ctr, Dept Elect Engn, Auburn, AL 36849 USA
[2] IBM Corp, Microelect, Hopewell Jct, NY 12533 USA
关键词
avalanche multiplication; dead space" effect; early effect; HBT; impact ionization; nonequilibrium transport; SiGe;
D O I
10.1109/16.760410
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents measurements of the avalanche multiplication factor (M - 1) in SiGe HBT's using a new technique capable of separating the avalanche multiplication and Early effect contributions to the increase of collector current with collector-base bias, as well as allowing safe measurements at practical current densities. The impact of collector doping, current density, Ge profile, and operation temperature are reported for the first time using measured and simulated results from a production quality UHV/CVD Sice HBT technology. Limitations of the technique in the presence of significant self-heating are discussed. By turning on the secondary hole impact ionization, we revealed the difference in impact ionization between strained SiGe and Si in the presence of the "dead space" effect, Despite its smaller bandgap, the compressively strained SiGe layer shows an apparent decrease in the secondary hole impact ionization rate compared to Si.
引用
收藏
页码:1007 / 1015
页数:9
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共 36 条
  • [1] Collector-base junction avalanche multiplication effects in advanced UHV/CVD SiGe HBT's
    Niu, GF
    Cressler, JD
    Gogineni, U
    Harame, DL
    [J]. IEEE ELECTRON DEVICE LETTERS, 1998, 19 (08) : 288 - 290
  • [2] Quantifying neutral base recombination and the effects of collector-base junction traps in UHV/CVD SiGe HBT's
    Niu, G
    Cressler, JD
    Joseph, AJ
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (12) : 2499 - 2504
  • [3] Extraction of collector-base resistance of UHV/CVD SiGe HBTs operating at low temperatures
    Gogineni, U
    Niu, G
    Cressler, JD
    [J]. JOURNAL DE PHYSIQUE IV, 1998, 8 (P3): : 95 - 98
  • [4] Hot carrier reliability of high-speed SiGe HBT's under accelerated collector-base avalanche bias
    Yang, Zhijian
    Guarin, Fernando
    Hostetter, Ed
    Wang, Ping-Chuan
    [J]. 2008 7TH INTERNATIONAL CARIBBEAN CONFERENCE ON DEVICES, CIRCUITS AND SYSTEMS, 2008, : 325 - 331
  • [5] Experimental method to extract AC collector-base resistance from SiGe HBT's
    Hamel, JS
    Alison, RJ
    Blaikie, RJ
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1997, 44 (11) : 1944 - 1950
  • [6] Base-profile optimization for minimum noise figure in advanced UHV/CVD SiGe HBT's
    Ansley, WE
    Cressler, JD
    Richey, DM
    [J]. IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 1998, 46 (05) : 653 - 660
  • [7] Experimental method to extract AC collector-base resistance from SiGe HBT's
    Univ of Southampton, Southampton, United Kingdom
    [J]. IEEE Trans Electron Devices, 11 (1944-1949):
  • [8] Scaling issues and Ge profile optimization in advanced UHV/CVD SiGe HBT's
    Richey, DM
    Cressler, JD
    Joseph, AJ
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1997, 44 (03) : 431 - 440
  • [9] Structural characterization of a UHV/CVD-grown SiGe HBT with graded base
    Dion, M
    Houghton, DC
    Rowell, NL
    Perovic, DD
    Aers, GC
    Rolfe, SJ
    Sproule, GI
    Phillips, JR
    [J]. THIN SOLID FILMS, 1998, 321 : 167 - 171
  • [10] Neutron radiation tolerance of advanced UHV/CVD SiGe HBT BiCMOS technology
    Roldan, Juan M.
    Ansley, William E.
    Cressler, John D.
    Clark, Steven D.
    Nguyen-Ngoc, Dominique
    [J]. IEEE Transactions on Nuclear Science, 1997, 44 (6 pt 1): : 1965 - 1973