Voxel-based morphometry of grey matter reductions in subjects at high risk of schizophrenia and the impact of specific templates

被引：0
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作者：
Job, DE [1 ]
Whalley, HC [1 ]
Glabus, M [1 ]
Johnstone, EC [1 ]
Lawrie, SM [1 ]
机构：
[1] Univ Edinburgh, Dept Psychiat, Edinburgh EH8 9YL, Midlothian, Scotland
来源：
SCHIZOPHRENIA RESEARCH | 2002年 / 53卷 / 03期
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中图分类号：
R749 [精神病学];
学科分类号：
100205 ;
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页码：96 / 96
页数：1
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