In phosphorescent organic light-emitting diodes (OLEDs), a hole transporting layer is traditionally thought to be required to facilitate hole injection into the host molecule. It is found that fac-tris(2-phenylpyridine)iridium [Ir(ppy)(3)] doped into 4,4(')-N,N-'-dicarbazole-biphenyl can be used to directly inject and transport holes from an indium tin oxide anode, and thus simplify the device structure and selection of materials. The efficiencies of the simplified bilayer OLEDs exceed 41 lm/W and 57 cd/A at a brightness of 100 cd/m(2). We attribute the excellent performance to direct hole injection from the anode to Ir(ppy)(3) dopant.
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School of Chemical and Biological Engineering, Seoul National University, Shinlim-dong, Kwanak-gu, Seoul 151-742, Korea, Republic ofSchool of Chemical and Biological Engineering, Seoul National University, Shinlim-dong, Kwanak-gu, Seoul 151-742, Korea, Republic of
Kim, Sung Hyun
Jang, Jyongsik
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School of Chemical and Biological Engineering, Seoul National University, Shinlim-dong, Kwanak-gu, Seoul 151-742, Korea, Republic ofSchool of Chemical and Biological Engineering, Seoul National University, Shinlim-dong, Kwanak-gu, Seoul 151-742, Korea, Republic of
Jang, Jyongsik
Yook, Kyoung Soo
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Department of Polymer Science and Engineering, Dankook University, Jukjeon-dong, Suji-gu, Yongin, Kyeonggi 448-701, Korea, Republic ofSchool of Chemical and Biological Engineering, Seoul National University, Shinlim-dong, Kwanak-gu, Seoul 151-742, Korea, Republic of
Yook, Kyoung Soo
Lee, Jun Yeob
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Department of Polymer Science and Engineering, Dankook University, Jukjeon-dong, Suji-gu, Yongin, Kyeonggi 448-701, Korea, Republic ofSchool of Chemical and Biological Engineering, Seoul National University, Shinlim-dong, Kwanak-gu, Seoul 151-742, Korea, Republic of
Lee, Jun Yeob
Gong, Myoung-Seon
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Department of Chemistry, Dankook University, San 29, Anseo-dong, Cheonan, Chungnam 330-714, Korea, Republic ofSchool of Chemical and Biological Engineering, Seoul National University, Shinlim-dong, Kwanak-gu, Seoul 151-742, Korea, Republic of
Gong, Myoung-Seon
Ryu, Sangouk
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Department of Electronics Engineering, Dankook University, San 29, Anseo-dong, Cheonan, Chungnam 330-714, Korea, Republic ofSchool of Chemical and Biological Engineering, Seoul National University, Shinlim-dong, Kwanak-gu, Seoul 151-742, Korea, Republic of
Ryu, Sangouk
Chang, Gee-Keun
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Department of Electronics Engineering, Dankook University, San 29, Anseo-dong, Cheonan, Chungnam 330-714, Korea, Republic ofSchool of Chemical and Biological Engineering, Seoul National University, Shinlim-dong, Kwanak-gu, Seoul 151-742, Korea, Republic of
Chang, Gee-Keun
Chang, Ho Jung
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Department of Electronics Engineering, Dankook University, San 29, Anseo-dong, Cheonan, Chungnam 330-714, Korea, Republic ofSchool of Chemical and Biological Engineering, Seoul National University, Shinlim-dong, Kwanak-gu, Seoul 151-742, Korea, Republic of
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Japan Broadcasting Corp NHK, Sci & Technol Res Labs, Setagaya Ku, Tokyo 1578510, JapanJapan Broadcasting Corp NHK, Sci & Technol Res Labs, Setagaya Ku, Tokyo 1578510, Japan
Fukagawa, Hirohiko
Shimizu, Takahisa
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Japan Broadcasting Corp NHK, Sci & Technol Res Labs, Setagaya Ku, Tokyo 1578510, JapanJapan Broadcasting Corp NHK, Sci & Technol Res Labs, Setagaya Ku, Tokyo 1578510, Japan
Shimizu, Takahisa
Osada, Yoshichika
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Tokyo Univ Sci, Shinjuku Ku, Tokyo 1628610, JapanJapan Broadcasting Corp NHK, Sci & Technol Res Labs, Setagaya Ku, Tokyo 1578510, Japan
Osada, Yoshichika
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Kamada, Taisuke
Kiribayashi, Yukihiro
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Tokyo Univ Sci, Shinjuku Ku, Tokyo 1628610, JapanJapan Broadcasting Corp NHK, Sci & Technol Res Labs, Setagaya Ku, Tokyo 1578510, Japan
Kiribayashi, Yukihiro
Yamamoto, Toshihiro
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Japan Broadcasting Corp NHK, Sci & Technol Res Labs, Setagaya Ku, Tokyo 1578510, JapanJapan Broadcasting Corp NHK, Sci & Technol Res Labs, Setagaya Ku, Tokyo 1578510, Japan
Yamamoto, Toshihiro
Shimidzu, Naoki
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Japan Broadcasting Corp NHK, Sci & Technol Res Labs, Setagaya Ku, Tokyo 1578510, JapanJapan Broadcasting Corp NHK, Sci & Technol Res Labs, Setagaya Ku, Tokyo 1578510, Japan