Synthesis and optical properties of tantalum oxide films prepared by ionized plasma-assisted pulsed laser deposition

被引:18
|
作者
He, Xiliang [1 ,2 ]
Wu, Jiehua [3 ]
Zhao, Lili [3 ]
Meng, Jia [3 ]
Gao, Xiangdong [1 ]
Li, Xiaomin [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfin M, Shanghai 200050, Peoples R China
[2] Chinese Acad Sci, Grad Sch, Shanghai 200050, Peoples R China
[3] Chinese Acad Sci, Shanghai Inst Ceram, Key Lab Inorgan Coating Mat, Shanghai 200050, Peoples R China
基金
中国国家自然科学基金;
关键词
tantalum oxide films; ionized plasma-assisted pulsed laser deposition; optical properties;
D O I
10.1016/j.ssc.2008.05.007
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
In this work, tantalum oxide (TaOx) films were deposited on quartz glass substrates by pulsed laser deposition (PLD) and ionized plasma-assisted pulsed laser deposition (IPA-PLD). The effects of oxygen pressures and ionized oxygen plasma-assistance (IOPA) on the optical properties of deposited films have been studied. Ultraviolet-visible-near infrared (UV-VIS-NIR) scanning spectrophotometry was used to measure the transmittance of deposited films and to determine the optical band gap and absorption coefficient. Results show that the transmittance, absorption coefficient, band gap and chemical composition of deposited films reveal a strong dependence on the oxygen pressures and IOPA. Under optimum condition of IOPA, the refractive index of the synthesized film was 2.22 (at 633 nm wavelength), while an optical band gap of 4.18 eV was obtained. These two values compare very favorably with films produced by other methods. (C) 2008 Elsevier Ltd. All rights reserved.
引用
收藏
页码:90 / 93
页数:4
相关论文
共 50 条
  • [1] Synthesis of p-type zinc oxide films by plasma-assisted pulsed laser deposition
    Tomoyuki Uehara
    Satoshi Kurumi
    Kouichi Takase
    Kaoru Suzuki
    Applied Physics A, 2010, 101 : 723 - 725
  • [2] Synthesis of p-type zinc oxide films by plasma-assisted pulsed laser deposition
    Uehara, Tomoyuki
    Kurumi, Satoshi
    Takase, Kouichi
    Suzuki, Kaoru
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2010, 101 (04): : 723 - 725
  • [3] Structure, morphology and optical properties of SiO2-x thin films prepared by plasma-assisted pulsed laser deposition
    He, Xiliang
    Wu, Jiehua
    Wu, Lingnan
    Zhao, Lili
    Gao, Xiangdong
    Li, Xiaomin
    APPLIED SURFACE SCIENCE, 2008, 254 (06) : 1730 - 1735
  • [4] Growth and properties of KNbO3 thin films prepared by microwave plasma-assisted pulsed laser deposition
    Yeo, JS
    Huang, TF
    Hammond, RH
    Hesselink, L
    INTEGRATED THIN FILMS AND APPLICATIONS, 1998, 86 : 101 - 108
  • [5] Growth properties of gallium oxide on sapphire substrate by plasma-assisted pulsed laser deposition
    Hu, Congyu
    Saito, Katsuhiko
    Tanaka, Tooru
    Guo, Qixin
    JOURNAL OF SEMICONDUCTORS, 2019, 40 (12)
  • [6] Growth properties of gallium oxide on sapphire substrate by plasma-assisted pulsed laser deposition
    Congyu Hu
    Katsuhiko Saito
    Tooru Tanaka
    Qixin Guo
    Journal of Semiconductors, 2019, 40 (12) : 89 - 93
  • [7] On the optical properties of bismuth oxide thin films prepared by pulsed laser deposition
    Leontie, L
    Caraman, M
    Visinoiu, A
    Rusu, GI
    THIN SOLID FILMS, 2005, 473 (02) : 230 - 235
  • [8] Effects of the post-annealing ambience on the microstructure and optical properties of tantalum oxide films prepared by pulsed laser deposition
    He, Xiliang
    Wu, Jiehua
    Li, Xiaomin
    Gao, Xiangdong
    Gan, Xiaoyan
    Zhao, Lili
    Journal of Alloys and Compounds, 2009, 478 (1-2): : 453 - 457
  • [9] Effects of the post-annealing ambience on the microstructure and optical properties of tantalum oxide films prepared by pulsed laser deposition
    He, Xiliang
    Wu, Jiehua
    Li, Xiaomin
    Gao, Xiangdong
    Gan, Xiaoyan
    Zhao, Lili
    JOURNAL OF ALLOYS AND COMPOUNDS, 2009, 478 (1-2) : 453 - 457
  • [10] Microstructures, electrical and optical characteristics of ZnO thin films by oxygen plasma-assisted pulsed laser deposition
    Gu, Yanfei
    Li, Xiaomin
    Yu, Weidong
    Gao, Xiangdong
    Zhao, Junliang
    Yang, Chang
    JOURNAL OF CRYSTAL GROWTH, 2007, 305 (01) : 36 - 39