Estimation of exposure parameters of chosen e-beam resists using variable shaped e-beam pattern generator

被引：0
|
作者：
Andok, Robert [1 ]
Matay, Ladislav [1 ]
Kostic, Ivan [1 ]
Bencurova, Anna [1 ]
Nemec, Pavol [1 ]
Konecnikova, Anna [1 ]
Ritomsky, Adrian [1 ]
机构：
[1] Slovak Acad Sci, Inst Informat, SK-84507 Bratislava, Slovakia
来源：
NINTH INTERNATIONAL CONFERENCE ON ADVANCED SEMICONDUCTOR DEVICES AND MICROSYSTEMS | 2012年
关键词：
LITHOGRAPHY;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this article we present results from lithography experiments on PMMA (positive tone), and HSQ Fox-12 and SU-8 (negative tone) resists carried out on the ZBA variable shaped e-beam pattern generators. In order to obtain the necessary information needed for the optimization of the exposure control Point Spread Function PSF, several lithography tests are mentioned. The carried out measurements and analysis of the results help us in obtaining important information about the resists and exposure processes and enable us to practically verify the suggested methods of parameters extraction for a reliable exposure model.
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页码：287 / 290
页数：4
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