Capacitive micro-sensor for the detection of dextrose

This work demonstrates the fabrication and electrical characterization of aluminum micro-gap on silicon substrate. For low cost and time conventional photolithography technique has been applied to fabricate the aluminum micro-gap. The fabricated device was tested for different molarities of dextrose. For the micro-gap fabrication chrome mask was design using AutoCAD software. The size of the fabricated micro-gap was around 81.7 mu m. The electrical measurements were carried out using Alpha high frequency dielectric analyzer. It was observed that when the dextrose concentration varied from 250 mu M to 1 mu M the capacitance value fluctuates from 330nF to 10nF. The limit of detection for the fabricated device was 1 mu M.