Multiscale modeling motivation, strategy, and approaches for nanoscale material and device design and development

被引：0
|
作者：
Barto, Richard R. [1 ]
Borders, Tammie L. [2 ]
Breneman, Curt M. [3 ]
Schadler, Linda S. [4 ,5 ]
Cho, K. J. [6 ]
机构：
[1] Lockheed Martin Adv Technol Labs, Distributed Syst Lab Computat Phys, Cherry Hill, NJ 08002 USA
[2] Univ N Texas, Dept Chem, Denton, TX 76203 USA
[3] Rensselaer Polytech Inst, Dept Chem, RECCR Ctr, Ctr Biotechnol & Interdisciplinary Studies, Troy, NY 12180 USA
[4] Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12180 USA
[5] Rensselaer Polytech Inst, Rensselaer Nanotechnol Ctr, Troy, NY 12180 USA
[6] Univ Texas Dallas, Dept Phys, Richardson, TX 75080 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2009年 / 237卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
70-COMP
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页数：1
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