Initial stages of growth of poly(p-xylylene) coatings: AFM study

被引:9
|
作者
Strel'tsov, D. R. [1 ]
Grigor'ev, E. I. [1 ]
Dmitryakov, P. V. [1 ]
Erina, N. A. [2 ]
Mailyan, K. A. [1 ]
Pebalk, A. V. [1 ]
Chvalun, S. N. [1 ]
机构
[1] LY Karpov Phys Chem Res Inst, Moscow 105064, Russia
[2] Veeco Metrol Grp, Santa Barbara, CA 93117 USA
基金
俄罗斯基础研究基金会;
关键词
CHEMICAL-VAPOR-DEPOSITION; POLY-P-XYLYLENE; PARYLENE; SURFACE; FILMS; POLYMERIZATION; MORPHOLOGY; MODEL;
D O I
10.1134/S0965545X09080069
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The morphology of poly(p-xylylene) ultrathin films prepared by vapor deposition polymerization on the surface of single-crystal silicon (100) and on the cleaved surface of mica at a substrate temperature of 20A degrees C has been studied by atomic force microscopy. At the initial stage, the growth of the poly(p-xylylene) coating follows the island mechanism. Within the framework of pyramidal model of island growth, the mean diffusion length for monomer p-xylylene is calculated: For the single-crystal silicon, this parameter is 15 +/- 3 nm; for the cleaved surface of mica, 9 +/- 2 nm. The nature of the substrate and defects on its surface show a peculiar effect on the structure of the poly(p-xylylene) coating. Thus, at a low monomer flow, nucleation of polymer islands on the surface of silicon is predominantly homogeneous, whereas on the cleaved surface of mica, it is heterogeneous. A change in the monomer flow significantly affects the rate of nucleation of polymer islands.
引用
收藏
页码:881 / 890
页数:10
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