Effect of localized and delocalized electrons on the low-temperature conductivity and magnetoconductivity of metallic Ge homogeneously doped by As

被引:2
|
作者
Rentzsch, R
Ionov, AN
Fozooni, P
Lea, MJ
机构
[1] Free Univ Berlin, Inst Expt Phys, D-14195 Berlin, Germany
[2] Russian Acad Sci, AF Ioffe Phys Tech Inst, St Petersburg 196140, Russia
[3] Univ London Royal Holloway & Bedford New Coll, Dept Phys, Egham TW20 0EX, Surrey, England
来源
PHYSICA B | 2000年 / 284卷
关键词
doped semiconductors; localization; metal-insulator transition;
D O I
10.1016/S0921-4526(99)02609-5
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
At T = 20 mK-2 K we analyze the temperature dependence of conductivity and magnetoconductivity of a series of metallic samples of Ge:As close to the critical free carrier concentration n(c) congruent to 3.5 x 10(17) cm(-3) of the metal-insulator transition. At it less than or equal to 5.7 x 10(17) cm(-3) we find a logarithmic correction to the conductivity instead of sigma proportional to T-1/2 found at higher it. The conductivity as well as the anomalous positive magnetoresistivity can be interpreted as a Kondo-like effect of localized and delocalized electrons with an antiferromagnetic exchange interaction slightly above n(c). (C) 2000 Elsevier Science B.V, All rights reserved.
引用
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页码:1185 / 1186
页数:2
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