Progressive amorphization of GeSbTe phase-change material under electron beam irradiation

被引:27
|
作者
Jiang, Ting-Ting [1 ]
Wang, Jiang-Jing [1 ,2 ]
Lu, Lu [3 ]
Ma, Chuan-Sheng [3 ]
Zhang, Dan-Li [1 ]
Rao, Feng [4 ]
Jia, Chun-Lin [3 ,5 ]
Zhang, Wei [1 ]
机构
[1] Xi An Jiao Tong Univ, State Key Lab Mech Behav Mat, Ctr Adv Mat Performance Nanoscale, Xian 710049, Shaanxi, Peoples R China
[2] Yulin Univ, Sch Chem & Chem Engn, Yulin 719000, Peoples R China
[3] Xi An Jiao Tong Univ, State Key Lab Mech Behav Mat, Sch Microelect, Xian 710049, Shaanxi, Peoples R China
[4] Shenzhen Univ, Coll Mat Sci & Engn, Shenzhen 518060, Peoples R China
[5] Forschungszentrum Julich, Ernst Ruska Ctr Microscopy & Spect Electrons, D-52425 Julich, Germany
基金
中国国家自然科学基金;
关键词
THIN-FILMS; DAMAGE; CRYSTALLIZATION; MEMORY; TRANSITIONS; MICROSCOPY; MEMRISTORS;
D O I
10.1063/1.5102075
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Fast and reversible phase transitions in chalcogenide phase-change materials (PCMs), in particular, Ge-Sb-Te compounds, are not only of fundamental interests but also make PCMs based random access memory a leading candidate for nonvolatile memory and neuromorphic computing devices. To RESET the memory cell, crystalline Ge-Sb-Te has to undergo phase transitions first to a liquid state and then to an amorphous state, corresponding to an abrupt change in electrical resistance. In this work, we demonstrate a progressive amorphization process in GeSb2Te4 thin films under electron beam irradiation on a transmission electron microscope (TEM). Melting is shown to be completely absent by the in situ TEM experiments. The progressive amorphization process resembles closely the cumulative crystallization process that accompanies a continuous change in electrical resistance. Our work suggests that if displacement forces can be implemented properly, it should be possible to emulate symmetric neuronal dynamics by using PCMs. (C) 2019 Author(s).
引用
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页数:5
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