Thin-film barristor: A gate-tunable vertical graphene-pentacene device

被引:51
|
作者
Ojeda-Aristizabal, C. [1 ]
Bao, W. [1 ]
Fuhrer, M. S. [1 ,2 ]
机构
[1] Univ Maryland, Ctr Nanophys & Adv Mat, College Pk, MD 20742 USA
[2] Monash Univ, Sch Phys, Clayton, Vic 3800, Australia
基金
澳大利亚研究理事会; 美国国家科学基金会;
关键词
D O I
10.1103/PhysRevB.88.035435
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We fabricate a vertical thin-film barristor device consisting of highly doped silicon (gate), 300 nm SiO2 (gate dielectric), monolayer graphene, pentacene, and a gold top electrode. We show that the current across the device is modulated by the Fermi energy level of graphene, tuned with an external gate voltage. We interpret the device current within the thermionic emission theory, showing a modulation of the energy barrier between graphene and pentacene as large as 300 meV.
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页数:4
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