Properties of thin and ultra-thin YBCO films grown by a Co-evaporation technique

被引:4
|
作者
Lesueur, J [1 ]
Aprili, M [1 ]
Horton, TJ [1 ]
Lalu, F [1 ]
GuillouxViry, M [1 ]
Perrin, A [1 ]
Dumoulin, L [1 ]
机构
[1] UNIV RENNES 1, LCSIM, CNRS, URA 1495, F-35042 RENNES, FRANCE
关键词
YBCO films; Co-evaporation;
D O I
10.1016/S0925-8388(96)02791-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
An original system has been set up to grow epitaxially high quality YBCO thin films in a very reproducible way. This in-situ quasi-MBE technique allows us to prepare films whose cationic composition is kept close to 1:2:3 within 2%, and which therefore display very good crystallographic properties together with a very Bat surface, Moreover, shadow masks are used to grow up to 4 films of different thicknesses in a single run and to make in-sim contact pads and caps. As a result, we routinely obtain YBCO c-axis films with a Tc(R=0) over 89.5 K (for 50 nm thick films on SrTiO3 and MgO) and a resistivity at RT in the 250 mu Omega cm range. The reproducibility is excellent, and the spread in resistivities for 2 films in a single run is less than 2%, Ultra-thin films (5 nm to 50 nm thick) whose electrical properties can hence be closely studied have been grown successfully in a single run.
引用
收藏
页码:156 / 160
页数:5
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