On the quality of quality-factor in gap-closing electrostatic resonators

被引：6
|
作者：
Shmulevich, Shai [1 ]
Lerman, Michael [1 ]
Elata, David [1 ]
机构：
[1] Technion Israel Inst Technol, IL-32000 Haifa, Israel
来源：
JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 2013年 / 23卷 / 11期
关键词：
MEMS; SILICON;
D O I：
10.1088/0960-1317/23/11/115010
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We present analytic expressions for three common measures of the dynamic response in gap-closing electrostatic resonators. We show that peak gain, peak sharpness and logarithmic decrement are distinctively different and are not equal to the quality-factor of the unloaded system. We experimentally validate our theoretical predictions by characterizing the dynamic response of test devices. The significance of this work is that it clarifies the correct way in which the performance of MEMS resonators should be reported to avoid ambiguity.
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页数：10
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