Effect of the Deposition Parameters on the Mechanical Properties of Ti-B-C Films Deposited by Magnetron Sputtering

被引：0
|
作者：
Xu Shuyan [1 ]
Wang Lihai [1 ]
Xiao Shengling [1 ]
Luo Dian [2 ]
Tang Guangze [2 ]
Ma Xinxin [2 ]
机构：
[1] Northeast Forestry Univ, Harbin 150040, Peoples R China
[2] Harbin Inst Technol, Harbin 150001, Peoples R China
来源：
RARE METAL MATERIALS AND ENGINEERING | 2013年 / 42卷
关键词：
Ti-B-C films; mechanical properties; magnetron sputtering; COATINGS; RESISTANCE;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Ti-B-C films with different compositions and structures were deposited by unbalanced magnetron sputtering with Ti/B4C compound target. XRD, XPS and nano-indentation were used to analyze the composition, structure and mechanical properties of Ti-B-C films. The change of the deposition temperature affects little the composition, but can affect the structure of the films. The change of the excitation coil current influence the composition and structure of films. The sputtering voltage has little influence on the composition and structure of the films. The high performance films can be obtained by adjusting the deposition parameters and heat-treatment conditions.
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收藏
页码：179 / 182
页数：4
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