Defect characterisation in amorphous diamond-like carbon coatings

被引：4
|
作者：
Britton, DT [1 ]
Härting, M
Hempel, M
Gxawu, D
Uhlmann, K
机构：
[1] Univ Cape Town, Dept Phys, ZA-7701 Rondebosch, South Africa
[2] Univ North, Dept Phys, ZA-9866 Phutaditjhaba, South Africa
[3] Univ Bundeswehr Munchen, Fachbereich Elektrotech, Wissensch Einrichtung Phys, D-85577 Neubiberg, Germany
来源：
APPLIED SURFACE SCIENCE | 1999年 / 149卷 / 1-4期
关键词：
diamond-like carbon; amorphous carbon; a-C : H; defect characterisation;
D O I：
10.1016/S0169-4332(99)00187-7
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Amorphous diamond-like carbon coatings, produced by ion beam assisted physical vapour deposition (IBAD) and plasma enhanced chemical vapour deposition (PECVD) on Si(100) substrates have been studied by positron beam and other techniques. Both layers have similar positron annihilation characteristics and a density of 2.4 +/- 0.3 g cm(-3), and are probably significantly hydrogenated In the LEAD sample there is significant damage to the substrate, including a deep armorphised region and evidence of defect states at the interface to the carbon. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：130 / 134
页数：5
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