Analysis of RF MEMS shunt capacitive switch with uniform and non-uniform meanders

被引:41
|
作者
Sravani, K. Girija [1 ]
Rao, K. Srinivasa [1 ]
机构
[1] KL Univ, Dept ECE, Microelect Res Grp, Guntur 520502, Andhra Pradesh, India
关键词
ACTUATION VOLTAGE; DESIGN;
D O I
10.1007/s00542-017-3507-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports on electromechanical, switching time and performance analysis of capacitive shunt RF MEMS switch with uniform and non-uniform meanders. The MEMS switch is a freely moving membrane over coplanar wave guide. Electromechanical analysis is done for movable beam with gold as material and dielectric as Si3N4 and HfO2. For these dielectric materials pull in voltage is 2.3 and 2 V respectively with beam thickness of 0.8 A mu m by using COMSOL FEM Tool. Si3N4 with dielectric constant of 7.6 gives C-ratio of 8.69 and 11.13 for 0.8 and 0.6 mu m of beam thickness respectively. RF performance analysis is done by using HFSS software and the simulation results states that non uniform single meander has return loss as -60 dB, insertion loss -0.2 dB and isolation loss -14 dB at 20 GHz frequency and uniform 3 meander switch has return loss as -55 dB. Switching time analysis is done by using MATLAB. For uniform three meander it is 0.12 ms and for non-uniform one meander beam it is 0.7 ms. Whereas use of HfO2 with dielectric constant of 14 as dielectric gives C-ratio of 14.93 and 19.66 for 0.8 and 0.6 mu m of beam thickness respectively with gap between the electrode beam and dielectric as 0.8 mu m.
引用
收藏
页码:1309 / 1315
页数:7
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