GeSn p-i-n detectors integrated on Si with up to 4% Sn

被引：175
|
作者：
Oehme, M. [1 ]
Schmid, M. [1 ]
Kaschel, M. [1 ]
Gollhofer, M. [1 ]
Widmann, D. [1 ]
Kasper, E. [1 ]
Schulze, J. [1 ]
机构：
[1] Univ Stuttgart, Inst Halbleitertech, D-70569 Stuttgart, Germany
来源：
APPLIED PHYSICS LETTERS | 2012年 / 101卷 / 14期
关键词：
SILICON; GERMANIUM; PHOTODETECTORS; PHOTODIODES; PHOTONICS; GROWTH;
D O I：
10.1063/1.4757124
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
GeSn heterojunction photodetectors on Si substrates were grown with Sn concentration up to 4%, fabricated for vertical light incidence, and characterized. The complete layer structure was grown by means of ultra low temperature (100 degrees C) molecular beam epitaxy. The Sn content shifts the responsivity into the infrared, about 310 nm for the 4% Sn sample. An increase of the optical responsivity for wavelengths higher than 1550 nm can be observed with increasing Sn content. At 1600 nm, the optical responsivity is increased by more than a factor of 10 for the GeSn diode with 4% Sn in comparison to the Ge reference diode. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4757124]
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页数：4
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