DC Electrodeposition of Thick SmCo Films for MEMS Applications

被引：7
|
作者：
Chouarbi, K. [1 ,2 ]
Woytasik, M. [1 ]
Dufour-Gergam, E. [1 ]
Lefeuvre, E. [1 ]
Moulin, J. [1 ]
机构：
[1] Univ Paris Sud, Inst Elect Fondamentale, F-91405 Orsay, France
[2] STMicroelectronics, F-38000 Grenoble, France
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 2012年 / 159卷 / 10期
关键词：
CO;
D O I：
10.1149/2.051210jes
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
This paper reports a study of electrodeposition of SmCo in aqueous solution using a Hull cell. Different concentrations of cobalt ion in the electrolyte, addition of supporting electrolyte and different deposition time have been tested. High samarium contents and thicknesses have been obtained: up to 50% of Sm in the deposit and several microns. The oxygen contamination is linked to the samarium content and two elaboration parameters have been found for limiting this contamination: addition of supporting electrolyte and long deposition time. (C) 2012 The Electrochemical Society. [DOI: 10.1149/2.051210jes] All rights reserved.
引用
收藏
页码：D592 / D596
页数：5
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