Investigations of ZnO thin films deposited by a reactive pulsed laser ablation

被引：5
|
作者：
Cui, J. B. [1 ]
Soo, Y. C. [1 ]
Kandel, H. [1 ]
Thomas, M. A. [1 ]
Chen, T. P. [1 ]
Daghlian, C. P. [2 ]
机构：
[1] Univ Arkansas, Dept Phys & Astron, Little Rock, AR 72204 USA
[2] Dartmouth Coll, EM Facil, Hanover, NH 03755 USA
来源：
SCIENCE IN CHINA SERIES E-TECHNOLOGICAL SCIENCES | 2009年 / 52卷 / 01期
关键词：
thin films; pulsed laser deposition; optical property; zinc oxide; ZINC-OXIDE; OPTICAL-PROPERTIES; GROWTH; NANOWIRES; TEMPERATURE; TRANSPORT; TARGET; SI;
D O I：
10.1007/s11431-008-0339-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Highly transparent ZnO thin films were deposited at different substrate temperatures by pulsed laser deposition in an oxygen atmosphere. The thin films were characterized by various techniques including X-ray diffraction, scanning electron microscopy, optical absorption, and photoluminescence. We demonstrated that oriented wurtzite ZnO thin films could be deposited at room temperature using a high purity zinc target. Variable temperature photoluminescence revealed new characteristics in the band edge emission. The underlying mechanism for the observed phenomena was also discussed.
引用
收藏
页码：99 / 103
页数：5
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