The electrical and dielectric properties of the Au/Ti/Hf02/n-GaAs structures

被引:41
|
作者
Karabulut, Abdulkerim [1 ]
Turut, Abdulmecit [2 ]
Karatas, Sukru [3 ]
机构
[1] Sinop Univ, Dept Elect & Elect Engn, Fac Engn, Sinop, Turkey
[2] Istanbul Medeniyet Univ, Fac Sci, Engn Phys Dept, TR-34730 Istanbul, Turkey
[3] Kahramanmaras Sutcu Imam Univ, Fac Sci & Arts, Dept Phys, TR-46100 Kahramanmaras, Turkey
关键词
GaAs semiconductor; Temperature; Dielectric properties; Conductivity; CAPACITANCE-VOLTAGE CHARACTERISTICS; N-TYPE SILICON; SCHOTTKY DIODES; TEMPERATURE MEASUREMENTS; CONDUCTANCE TECHNIQUE; GAMMA-IRRADIATION; MIS STRUCTURES; MS STRUCTURES; FREQUENCY; CONDUCTIVITY;
D O I
10.1016/j.molstruc.2017.12.087
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this work, temperature dependent electrical and dielectric properties of the Au/Ti/HfO2/n-GaAs structures were investigated using capacitance-voltage (C-V) and conductance voltage (G-V) measurements in the temperature range of 60-320 K by steps of 20 K at 1 MHz. The dielectric constant (epsilon'), dielectric loss (89, dielectric loss tangent (tans) and ac electrical conductivities (sigma(ac)) have been calculated as a function of temperature. These values of the epsilon', epsilon '', tans delta and sigma(ac) have been found to be 2.272, 5.981, 2.631 and 3.32 x 10(-6) (Omega(-1)cm(-1)) at 80 K, respectively, 1.779, 2.315, 1.301 and 1.28 x 10(-6) (Omega(-1)cm(-1)), respectively at 320 K. These decrease of the dielectric parameters (epsilon', epsilon '', tans delta and sigma(ac)) have been observed at high temperatures. The experimental results show that electrical and dielectric properties are strongly temperature and bias voltage dependent. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:513 / 518
页数:6
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