Customized ion flux-energy distribution functions in capacitively coupled plasmas by voltage waveform tailoring

被引：23
|
作者：
Schuengel, E. [1 ]
Donko, Z. [2 ]
Hartmann, P. [2 ]
Derzsi, A. [2 ]
Korolov, I. [2 ]
Schulze, J. [1 ]
机构：
[1] W Virginia Univ, Dept Phys, Morgantown, WV 26506 USA
[2] Hungarian Acad Sci, Wigner Res Ctr Phys, Inst Solid State Phys & Opt, H-1121 Budapest, Hungary
来源：
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2015年 / 24卷 / 04期
关键词：
capacitively coupled plasmas; radio frequency discharges; voltage waveform tailoring; electrical asymmetry effect; distribution functions; ion energy control; DISCHARGE; SILICON;
D O I：
10.1088/0963-0252/24/4/045013
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
We propose a method to generate a single peak at a distinct energy in the ion flux-energy distribution function (IDF) at the electrode surfaces in capacitively coupled plasmas. The technique is based on the tailoring of the driving voltage waveform, i.e. adjusting the phases and amplitudes of the applied harmonics, to optimize the accumulation of ions created by charge exchange collisions and their subsequent acceleration by the sheath electric field. The position of the peak (i.e. the ion energy) and the flux of the ions within the peak of the IDF can be controlled in a wide domain by tuning the parameters of the applied RF voltage waveform, allowing optimization of various applications where surface reactions are induced at particular ion energies.
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页数：6
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