Magnetron Sputtering System for Fabrication of X-ray Multilayer Optics

被引:1
|
作者
Nayak, M. [1 ]
Rao, P. N. [1 ]
Lodha, G. S. [1 ]
机构
[1] Raja Ramanna Ctr Adv Technol, Ind Synchrotrons Utilizat Div, Xray Opt Sect, Indore 452013, Madhya Pradesh, India
关键词
Thin film deposition. Magnetron sputtering; X-ray multilayer optics; surface/interface analysis;
D O I
10.1063/1.4732398
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A specially designed DC/RF magnetron sputtering system has been installed for the development of large area x-ray multilayer (ML) optics at Indus synchrotron radiation facility. A brief description of the system configuration, automation and operating conditions are presented. The system has the capability of fabricating large area (300x100 -mm(2)) X-ray MLs with required accuracy, uniformity and reproducibility. Thin film growth suitable for fabrication of X-ray ML optics has achieved by optimizing the sputtering process parameters. The representative results are presented.
引用
收藏
页码:154 / 156
页数:3
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