Raman scattering study of BxGa1-xN growth on AIN template substrate

被引:2
|
作者
Hamady, S. Ould Saad [1 ,2 ]
Baghdadli, T. [3 ]
Gautier, S. [3 ]
Bouchaour, M. [3 ]
Martin, J. [3 ]
Ougazzaden, A. [2 ,4 ]
机构
[1] Univ Paul Verlaine Metz, CNRS, LMOPS, UMR 7132, F-57070 Metz, France
[2] Supelec, Georgia Tech, CNRS, UMI 2958, F-57070 Metz, France
[3] Univ Paul Verlaine Metz, CNRS, LMOPS, UMR 7132, F-57070 Metz, France
[4] Georgia Inst Technol GTL, Metaponto, Italy
关键词
D O I
10.1002/pssc.200779186
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this study, Raman scattering measuremenst are reported on the BxGa1-xN layers grown on AIN on sapphire templates by MOVPF. The boron content covered the composition range from 0% (pure GaN) to 1-75%. The Raman spectra were recorded at 300 K with a confocal micro Raman spectrometer in the backscattering geometries. Raman cartography at a lateral resolution of 1 mu m was performed to study the spatial variation of the phonon peaks characteristics. The homogeneity of BGaN layers was studied una the phonon modes characteristics are determined as a function of composition with respect to the laser polarisation. The I-2 and A(1)(LQ) modes frequencies are shifted with respect to the pure GaN. The A(1)(LO) mode behaviour correlates well with the free carriers concentration measured by Hall Effect method indicating a phonon-plaasmon coupling decreasing with increasing boron content in alloy. (C) 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:3051 / +
页数:2
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