Observation of oscillations in the transport for atomic layer MoS2

被引:0
|
作者
Xie, Xiao-Qiang [1 ]
Peng, Ying-Zi [1 ,2 ]
Zheng, Qi-Ye [1 ]
Li, Yuan [1 ,2 ]
Chen, Ji [1 ]
机构
[1] Hangzhou Dianzi Univ, Sch Sci, Dept Phys, Hangzhou 310018, Zhejiang, Peoples R China
[2] Hangzhou Dianzi Univ, Ctr Integrated Spintron Devices, Hangzhou 310018, Zhejiang, Peoples R China
基金
中国国家自然科学基金;
关键词
atomic-layer MoS2; oscillations in the transport; circular polarized light; photo-excited carriers; STATES; TRANSISTORS;
D O I
10.1088/1674-1056/27/2/028103
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
In our experiment, an atomic layer MoS2 structure grown on SiO2/Si substrates is used in transport test. The voltage U-14,U-23 oscillates and the corresponding period varies with applied current. The largest period appears at 45 mu A. The oscillation periods are different when samples are under laser radiation or in darkness. We discover that under the laser irradiation, the oscillation period occurs at lower current than in the darkness case. Meanwhile, the drift velocity is estimated at similar to 10(7) cm/s. Besides, by studying the envelope of U-14,U-23 versus applied current, we see a beating phenomenon at a certain current value. The beating period in darkness is larger than under laser irradiation. The difference between beating periods reveals the energy difference of electrons. Similar results are obtained by using different laser power densities and different light sources. The possible mechanism behind the oscillation period is discussed.
引用
收藏
页数:5
相关论文
共 50 条
  • [1] Observation of oscillations in the transport for atomic layer MoS2
    解晓强
    彭英姿
    郑奇烨
    李源
    陈吉
    [J]. Chinese Physics B, 2018, 27 (02) : 606 - 610
  • [2] Atomic Layer Processing of MoS2
    Wesley, Jen
    Hues, John D.
    Soares, Jake
    Letourneau, Steven
    Lawson, Matthew
    Choudhury, Devika
    Mane, Anil U.
    Lu, Yu
    Wu, Yaqiao
    Hues, Steven M.
    Li, Lan
    Elam, Jeffrey W.
    Graugnard, Elton
    [J]. 2023 IEEE WORKSHOP ON MICROELECTRONICS AND ELECTRON DEVICES, WMED, 2023, : 9 - 11
  • [3] Atomic layer deposition of a MoS2 film
    Tan, Lee Kheng
    Liu, Bo
    Teng, Jing Hua
    Guo, Shifeng
    Low, Hong Yee
    Tan, Hui Ru
    Chong, Christy Yuen Tung
    Yang, Ren Bin
    Loh, Kian Ping
    [J]. NANOSCALE, 2014, 6 (22) : 14002 - 14002
  • [4] Atomic layer deposition of a MoS2 film
    Tan, Lee Kheng
    Liu, Bo
    Teng, Jing Hua
    Guo, Shifeng
    Low, Hong Yee
    Loh, Kian Ping
    [J]. NANOSCALE, 2014, 6 (18) : 10584 - 10588
  • [5] Atomic Layer Etching Mechanism of MoS2 for Nanodevices
    Kim, Ki Seok
    Kim, Ki Hyun
    Nam, Yeonsig
    Jeon, Jaeho
    Yim, Soonmin
    Singh, Eric
    Lee, Jin Yong
    Lee, Sung Joo
    Jung, Yeon Sik
    Yeom, Geun Young
    Kim, Dong Woo
    [J]. ACS APPLIED MATERIALS & INTERFACES, 2017, 9 (13) : 11967 - 11976
  • [6] Atomic layer deposition of MoS2 thin films
    Browning, Robert
    Padigi, Prasanna
    Solanki, Raj
    Tweet, Douglas J.
    Schuele, Paul
    Evans, David
    [J]. MATERIALS RESEARCH EXPRESS, 2015, 2 (03)
  • [7] Modified atomic layer deposition of MoS2 thin films
    Zeng, Li
    Richey, Nathaniel E.
    Palm, David W.
    Oh, Il-Kwon
    Shi, Jingwei
    Maclsaac, Callisto
    Jaramillo, Thomas
    Bent, Stacey F.
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2020, 38 (06):
  • [8] Atomic-layer soft plasma etching of MoS2
    Xiao, Shaoqing
    Xiao, Peng
    Zhang, Xuecheng
    Yan, Dawei
    Gu, Xiaofeng
    Qin, Fang
    Ni, Zhenhua
    Han, Zhao Jun
    Ostrikov, Kostya
    [J]. SCIENTIFIC REPORTS, 2016, 6
  • [9] Atomic-layer soft plasma etching of MoS2
    Shaoqing Xiao
    Peng Xiao
    Xuecheng Zhang
    Dawei Yan
    Xiaofeng Gu
    Fang Qin
    Zhenhua Ni
    Zhao Jun Han
    Kostya (Ken) Ostrikov
    [J]. Scientific Reports, 6
  • [10] Stepwise growth of crystalline MoS2 in atomic layer deposition
    Cho, Ah-Jin
    Ryu, Seung Ho
    Yim, Jae Gyun
    Baek, In-Hwan
    Pyeon, Jung Joon
    Won, Sung Ok
    Baek, Seung-Hyub
    Kang, Chong-Yun
    Kim, Seong Keun
    [J]. JOURNAL OF MATERIALS CHEMISTRY C, 2022, 10 (18) : 7031 - 7038