Dual-gate AlGaN/GaN high-electron-mobility transistors with short gate length for high-power mixers

被引:0
|
作者
Shiojima, K [1 ]
Makimura, T
Maruyama, T
Kosugi, T
Suemitsu, T
Shigekawa, N
Hiroki, M
Yokoyama, H
机构
[1] NTT Corp, Photon Labs, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430198, Japan
[2] Nippon Telegraph & Tel Corp, Adv Technol, Atsugi, Kanagawa 2430198, Japan
关键词
D O I
10.1002/pssc.200564104
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have fabricated dual-gate AlGaN/GaN high-electron-mobility transistors (HEMTs) with a short gate on SiC substrates for use in high-power mixers and have measured the DC and up-conversion RF characteristics. A device with a T-shaped gate (0.15 mu m x 300 mu m) exhibits a maximum transconductance of 40 mS, an on-state breakdown voltage of over 30 V, and off-state breakdown voltage of 86 V. The maximum RF output power (P-RFout) is 17 dBm, and the up-conversion gain is 7.5 dB at a frequency of 10 GHz when the bias point voltage is 30 V. As the local frequency increases from 2 to 10 GHz, P-RFout and the gain decrease by only 2 and 2.6 dB, respectively. Shortening the gate was found to be effective in improving the frequency characteristics of a mixer at frequencies up to and including the X-band. (c) 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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页码:469 / +
页数:2
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