reflection electron microscopy (REM);
silicon;
surface stress;
transmission electron microscopy (TEM);
D O I:
10.1016/0039-6028(96)06226-7
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
Surface stress on Si surfaces was studied by reflection electron microscopy (REM) and transmission electron microscopy (TEM). For REM studies, a new specimen holder which can give strain to specimen surfaces was designed and constructed. Using this holder the specimen can be heated up to 1200 degrees C and a strain of similar to 0.1% can be applied to surfaces of Si crystals with a thickness of similar to 0.15 mm. Using the new holder, conversion processes between the (2 x 1) and (1 x 2) domains were observed in situ and compared with previous results obtained by LEED, It was found that the effect of heating current, which also causes the conversion of the major domains, disappears under a strain of similar to 0.05%. TEM studies were carried cut for Si(111)-(7 x 7) and Si(111)-(5 x 2)-Au surfaces.