Patterning of substrates using surface relief structures on an azobenzene-functionalized polymer film

被引:20
|
作者
Yang, SZ [1 ]
Yang, K
Niu, LG
Nagarajan, R
Bian, SP
Jain, AK
Kumar, J
机构
[1] Univ Massachusetts, Dept Phys, Ctr Adv Mat, Lowell, MA 01854 USA
[2] Univ Massachusetts, Dept Chem, Ctr Adv Mat, Lowell, MA 01854 USA
关键词
D O I
10.1002/adma.200306537
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A maskless method for patterning substrates using surface relief structures on azobenzene-functionalized polymer is demonstrated. Surface relief structures are inscribed on a polymer film spin-coated on an indium tin oxide (ITO) substrate by exposure to an interference pattern. Etching with oxygen plasma followed by a zinc-powder-catalyzed liquid etchant yields a periodically patterned ITO substrate (see Figure).
引用
收藏
页码:693 / +
页数:5
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