Characterization of oxygen and titanium diffusion at the anatase TiO2(001) surface

被引:8
|
作者
Herman, Gregory S. [1 ]
Zehr, Robert T. [2 ]
Henderson, Michael A. [2 ]
机构
[1] Oregon State Univ, Sch Chem Biol & Environm Engn, Corvallis, OR 97331 USA
[2] Pacific NW Natl Lab, Inst Interfacial Catalysis, Richland, WA 99352 USA
关键词
TiO2; Anatase; Diffusion; SIMS; Memristor; RUTILE TIO2(110); TIO2; WATER; PERSPECTIVE; MECHANISM; DEFECTS; SCIENCE; GROWTH;
D O I
10.1016/j.susc.2013.02.006
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The diffusion of intrinsic defects in a single crystal anatase TiO2(001) film was explored by isotopic labeling and static secondary ion mass spectrometry. Using both Ti-48 and O-18 as isotopic labels, we show that the anatase surface responds to redox imbalances by diffusion of both Ti and O into the bulk under vacuum reduction and (at least) Ti from the bulk to the surface during oxidation. The diffusion of Ti between the bulk and surface in anatase TiO2(001) closely resembles what was observed in the literature for the rutile TiO2(110) surface, however the latter is not known to have oxygen diffusion between the bulk and surface under typical ultrahigh vacuum conditions. We speculate that the open lattice of the anatase bulk structure may facilitate independent diffusion of both point defects (Ti interstitials and O vacancies) or concerted diffusion of "TiO" subunits. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:L5 / L8
页数:4
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