UV dielectric multilayers mirrors for Free Electron Lasers

被引:8
|
作者
Renault, E [1 ]
Nutarelli, D [1 ]
Garzella, D [1 ]
Couprie, ME [1 ]
Billardon, M [1 ]
机构
[1] CEA, DSM, DRECAM, Serv Photons Atomes & Mol, F-91191 Gif Sur Yvette, France
来源
关键词
Free Electron Laser; synchrotron radiation; induced damage; UV coatings; total losses measurement; surface roughness; absorption;
D O I
10.1117/12.360100
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Storage Ring Free Electron Lasers (FELs) are brand new laser sources where a relativistic electron beam passing through an undulator emits synchrotron radiation at a wavelength lambda which is tunable according to the electron beam energy and the magnetic field intensity. An overview of the SRFELs presently operating in the UV range is presented. The easy tunable FEL operation in the whole UV range is mainly limited by the mirrors losses, which should be maintained low even in the very hostile environment generated by the broadband high power spectrum of the undulator, extending to X rays, and which action lead to the mirrors degradation. Dedicated mirror measurements have been then developed in LURE, in the visible and in the UV range, for checking the mirrors performances before insertion in the optical cavity and after degradation. In order to insure a wide tunability range and large output power of the FEL, Low total losses are crucial for FEL oscillation at shorter wavelengths. New FEL sources, for instance at the ELETTRA synchrotron source, could then provide a widely tunable and powerful laser light down to 200 nm.
引用
收藏
页码:354 / 365
页数:12
相关论文
共 50 条
  • [1] Complete characterization of UV dielectric multilayer mirrors for performance improvement of Free Electron Lasers
    Nutarelli, D
    Couprie, ME
    Renault, E
    Roux, R
    Nahon, L
    Delboulbé, A
    Boccara, C
    Billardon, M
    FREE ELECTRON LASERS 1998, 1999, : II63 - II64
  • [2] Achromatic damage investigations on mirrors for UV - Free electron lasers
    Gatto, A
    Kaiser, N
    Thielsch, R
    Garzella, D
    Hirsch, M
    Nutarelli, D
    De Ninno, G
    Renault, E
    Couprie, ME
    Torchio, P
    Alvisi, M
    Albrand, G
    Amra, C
    Marsi, M
    Trovo, M
    Walker, R
    Grewe, M
    Roger, JP
    Boccara, C
    LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2000, PROCEEDINGS, 2001, 4347 : 535 - 546
  • [3] UV Free electron lasers
    Couprie, ME
    JOURNAL DE PHYSIQUE IV, 1999, 9 (P5): : 9 - 12
  • [4] PLASMA TREATMENT FOR RESTORATION OF DIELECTRIC MULTILAYER MIRRORS IN SHORT-WAVELENGTH FREE-ELECTRON LASERS
    YAMADA, K
    YAMAZAKI, T
    SHIMIZU, T
    SEI, N
    MIKADO, T
    APPLIED OPTICS, 1995, 34 (21): : 4261 - 4265
  • [5] Towards resistant UV mirrors at 200 nm for Free Electron Lasers Manufacture-Characterizations-Degradations tests
    Gatto, A
    Thielsch, R
    Kaiser, N
    Hirsch, M
    Garzella, D
    Nutarelli, D
    De Ninno, G
    Renault, E
    Couprie, ME
    Torchio, P
    Alvisi, M
    Albrand, G
    Amra, C
    Marsi, M
    Trovo, M
    Walker, R
    Grewe, M
    Robert, S
    Roger, JP
    Boccara, C
    INORGANIC OPTICAL MATERIALS II, 2000, 4102 : 261 - 275
  • [6] OPTICAL CAVITIES FOR UV FREE-ELECTRON LASERS
    COUPRIE, ME
    GARZELLA, D
    BILLARDON, M
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1995, 358 (1-3): : 382 - 386
  • [7] DIELECTRIC ENHANCED MIRRORS FOR IR LASERS
    RUDISILL, JE
    BRAUNSTEIN, M
    HARRINGTON, JA
    PEDINOFF, M
    ZUCCARO, D
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1979, 69 (10) : 1438 - 1438
  • [8] Selective UV Reflecting Mirrors Based on Nanoparticle Multilayers
    Castro Smirnov, J. R.
    Calvo, Mauricio E.
    Miguez, Hernan
    ADVANCED FUNCTIONAL MATERIALS, 2013, 23 (22) : 2805 - 2811
  • [9] UV FREE-ELECTRON LASERS FOR SYNCHROTRON RADIATION SOURCES
    PELLEGRINI, C
    NUCLEAR INSTRUMENTS & METHODS, 1980, 177 (01): : 227 - 233
  • [10] Total reflection amorphous carbon mirrors for vacuum ultraviolet free electron lasers
    Steeg, B
    Juha, L
    Feldhaus, J
    Jacobi, S
    Sobierajski, R
    Michaelsen, C
    Andrejczuk, A
    Krzywinski, J
    APPLIED PHYSICS LETTERS, 2004, 84 (05) : 657 - 659