Characteristics of epitaxial growth of CeO2 films on silicon substrates

被引：0
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作者：
Smolskii, OV
Mamutin, VV
Kartenko, NF
Denisov, DV
Kopev, PS
Melekh, BT
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PISMA V ZHURNAL TEKHNICHESKOI FIZIKI | 1996年 / 22卷 / 01期
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O59 [应用物理学];
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页码：68 / 73
页数：6
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