TWO BOUNDARY BASED DISPATCHING RULE FOR ON-TIME DELIVERY AND THROUGHPUT OF WAFER FABS WITH DEDICATION CONSTRAINTS

Presented in this paper is a dispatching rule to achieve the on-time delivery and throughput for a semiconductor wafer fabrication (FAB) with dedication constraint. It is necessary to improve throughput of production system as well as on-time delivery to make semiconductor companies more competitive. To be successful in the globalized competition, most of the companies have applied a concept of the production target which is defined as the quantity of production to be achieved for each day. Also, it is necessary to consider natural bias that significantly affects the alignment of patterns between different photolithography steps. As the natural bias has a negative effect on the quality and yield of products, most manufacturers have applied dedication constraint. If the dedication constraint is no managed properly, it may decrease the utilization of the photo machines related to the performance of wafer FAB. To overcome the problem, we propose the two boundary based dispatching rule considering the dedication constraint. The simulation model based on MIMAC6 was developed to prove the performance of this proposed dispatching rule, and conducted a simulation by using MOZART (R). The simulation results clearly show the advantages of the proposed dispatching rule over the other dispatching rules.