Electron field emission from silicon nanoprotrusions

被引:0
|
作者
Tabe, M [1 ]
Sawada, K [1 ]
Ishikawa, Y [1 ]
Ishida, M [1 ]
机构
[1] Shizuoka Univ, Elect Res Inst, Hamamatsu, Shizuoka 4328011, Japan
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Recently, enhanced field emission of electrons from a variety of nanostructured materials such as carbon nanotubes and porous Si has been extensively studied for application to displays and other vacuum electronic devices. In this work, we have studied field emission of electrons by using a diode experimental setup without gate electrodes from the most fundamental Si nanostructure, i.e., Si nanoprotrusions with both vertical and lateral sizes of 10similar to20 run and the density of 3similar to5x10(11) cm(-2). The protrusions were fabricated by our original self-organized selective oxidation technique, referred to as "nano-LOCOS". Although the Si protrusions were quite small, high emission current was detected at low anode voltages, depending on the microscopic shape controlled by oxidation conditions. This result encourages us to develop "bright" and "highly functional" electron emitting devices using the Si nanosystem.
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页码:1378 / 1382
页数:5
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