Fabrication and characterization of planar diamond electron emitters

被引:5
|
作者
Kawamura, H [1 ]
Maki, T [1 ]
Kobayashi, T [1 ]
机构
[1] Osaka Univ, Grad Sch Engn Sci, Osaka 5608531, Japan
关键词
vacuum microelectronics; CVD diamond; electron emitter; field emission; surface conductive layer;
D O I
10.1143/JJAP.38.2622
中图分类号
O59 [应用物理学];
学科分类号
摘要
A planar electron emitter was fabricated employing chemical vapor deposited (CVD) diamond particles. This device is composed of isolated particles of CVD diamond selectively deposited on a pair of patterned Pt films separated 4 micrometers from each other. Field emission current from the diamond particles was observed when the voltage was applied between the Pt films. The mechanism of electron emission from the diamond particles used in this device was discussed by comparing with the electron emission from a continuous diamond film. It was found that the effective work functions differ between the isolated particles and the continuous films. This result suggests a difference in the emission site of electrons.
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页码:2622 / 2625
页数:4
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