A micro-scale plasma spectrometer for space and plasma edge applications (invited)

被引：3

作者：

Scime, E. E. ^{[1
]}

Keesee, A. M. ^{[1
]}

Dugas, M. ^{[2
]}

Ellison, S. ^{[2
]}

Tersteeg, J. ^{[2
]}

Wagner, G. ^{[2
]}

Barrie, A. ^{[3
]}

Rager, A. ^{[3
]}

Elliott, D. ^{[1
]}

机构：

[1] West Virginia Univ, Dept Phys, Morgantown, WV 26506 USA

[2] Adv Res Corp, White Bear Lake, MN 55110 USA

[3] NASA, Goddard Space Flight Ctr, Greenbelt, MD 20771 USA

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 2016年 / 87卷 / 11期

基金：

美国国家航空航天局;

关键词：

DESIGN;

D O I：

10.1063/1.4960145

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A plasma spectrometer design based on advances in lithography and microchip stacking technologies is described. A series of curved plate energy analyzers, with an integrated collimator, is etched into a silicon wafer. Tests of spectrometer elements, the energy analyzer and collimator, were performed with a 5 keV electron beam. The measured collimator transmission and energy selectivity were in good agreement with design targets. A single wafer element could be used as a plasma processing or fusion first wall diagnostic. Published by AIP Publishing.

引用

页数：6

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