Optimum writing field for high-frequency magnetic recording

被引:5
|
作者
Igarashi, M [1 ]
Akagi, F [1 ]
Yoshida, K [1 ]
Nakamura, A [1 ]
Maruyama, Y [1 ]
Takano, H [1 ]
机构
[1] Hitachi Ltd, Cent Res Lab, Tokyo 1850843, Japan
关键词
high-frequency recording; optimum writing field; characteristic frequency; micro-magnetic simulation;
D O I
10.1109/20.800964
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Realistic recording conditions in longitudinal thin film media at high-frequency (up to I GHz) is investigated by a micro-magnetic simulation. It is found that the recording frequency should be set below the characteristic frequency (1/2Tr, where Tr is the rise time of the writing head); optimum writing field intensity must be increased by 1.2 Oe per MHz at a linear density of 244 kFCI; and remanence coercivity measured by a square pulse slightly increases up to 1 GHz when damping constant is 0.03.
引用
收藏
页码:2721 / 2723
页数:3
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