Micromachining of ultrananocrystalline diamond

被引:12
|
作者
Moldovan, N [1 ]
Auciello, O [1 ]
Sumant, AV [1 ]
Carlisle, JA [1 ]
Divan, R [1 ]
Gruen, DM [1 ]
Krauss, AR [1 ]
Mancini, DC [1 ]
Jayatissa, A [1 ]
Tucek, J [1 ]
机构
[1] Argonne Natl Lab, Expt Facil Div, Argonne, IL 60439 USA
关键词
D O I
10.1117/12.442958
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Ultrananocrystalline diamond (UNCD) with grain sizes in the range of 2-5 run is produced using a microwave plasma chemical vapor deposition process with argon-rich C-60 or CH4 plasmas. This material has excellent mechanical properties: high hardness and Young modulus, and an extremely low friction coefficient (similar to0.01). It is resistant to chemical attack, and is potentially biocompatible. These properties make UNCD a very good candidate for a diamond-based microelectromechanical systems (MEMS) technology. We report on the micromachinability of this material by selective seeding, selective growth and reactive ion etching, in conjunction with SiO2 sacrificial layers for fabricating 3-D structures with freestanding or movable parts. These micromachining techniques are used to develop a totally UNCD-made turbine as a demonstration for UNCD-based MEMS.
引用
收藏
页码:288 / 298
页数:11
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