Effect of ion-beam irradiation on magnetic anisotropy in Fe-Tb multilayers

被引：5
|
作者：
Tosello, C
Gratton, LM
Principi, G
Gupta, A
Gupta, R
机构：
[1] UNIV PADUA,SETTORE MAT,DIPARTIMENTO INGN MECCAN,I-35131 PADUA,ITALY
[2] DEVI AHILYA UNIV,DEPT PHYS,INDORE 452001,INDIA
[3] DEVI AHILYA UNIV,DEPT INSTRUMENTAT,INDORE 452001,INDIA
来源：
SURFACE & COATINGS TECHNOLOGY | 1996年 / 84卷 / 1-3期
关键词：
ion-beam mixing; magnetic anisotropy; Mossbauer spectroscopy;
D O I：
10.1016/S0257-8972(95)02746-7
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A Fe-57(6 nm)/Tb(0.7 nm) x 10 multilayer sample, deposited on a Kapton substrate in UHV, was irradiated with low-dose 100 keV Ar ions. By conversion electron Mossbauer spectroscopy it was observed that the angle between the normal to the surface of the film and the average direction of atomic spins increases upon irradiation, implying a decrease in perpendicular magnetic anisotropy (PMA). A detailed analysis of Mossbauer spectra suggests that irradiation produces an appreciable change in the thickness of the interface layer without the formation of any interfacial alloy phase. The observed change in PMA may be attributed to relaxation of interfacial stresses.
引用
收藏
页码：338 / 340
页数：3
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