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Residual stress, strain and defects: its effect on the band gap of poly-Ge thin film realized on glass via Au induced layer exchange crystallization process
被引:1
|作者:
Singh, Ch Kishan
[1
]
Mathews, T.
[1
]
Dhara, Sandip
[1
]
机构:
[1] HBNI, Surface & Nanosci Div, Indira Gandhi Ctr Atom Res, Mat Sci Grp, Kalpakkam 603102, India
关键词:
polycrystalline Ge thin film;
residual stress;
strain;
band gap narrowing;
SI;
COALESCENCE;
CONTACT;
SURFACE;
D O I:
10.1088/1402-4896/aca2ef
中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
Residual stress in polycrystalline-Ge thin film realized on glass substrate using Au-induced layer exchange crystallization process is evaluated using x-ray diffraction based technique. The measured stress is found to be tensile in nature, from which we delineate and discuss the extrinsic thermal and intrinsic growth stresses. An in-plane biaxial tensile strain similar to 0.15% was estimated to be endured by the polycrystalline-Ge thin film. The narrowing effect that such strain and the crystallization or growth-related defects have on the optical energy band gap of the polycrystalline-Ge thin film is elucidated.
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页数:9
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