Residual stress, strain and defects: its effect on the band gap of poly-Ge thin film realized on glass via Au induced layer exchange crystallization process

被引:1
|
作者
Singh, Ch Kishan [1 ]
Mathews, T. [1 ]
Dhara, Sandip [1 ]
机构
[1] HBNI, Surface & Nanosci Div, Indira Gandhi Ctr Atom Res, Mat Sci Grp, Kalpakkam 603102, India
关键词
polycrystalline Ge thin film; residual stress; strain; band gap narrowing; SI; COALESCENCE; CONTACT; SURFACE;
D O I
10.1088/1402-4896/aca2ef
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Residual stress in polycrystalline-Ge thin film realized on glass substrate using Au-induced layer exchange crystallization process is evaluated using x-ray diffraction based technique. The measured stress is found to be tensile in nature, from which we delineate and discuss the extrinsic thermal and intrinsic growth stresses. An in-plane biaxial tensile strain similar to 0.15% was estimated to be endured by the polycrystalline-Ge thin film. The narrowing effect that such strain and the crystallization or growth-related defects have on the optical energy band gap of the polycrystalline-Ge thin film is elucidated.
引用
收藏
页数:9
相关论文
共 6 条
  • [1] A very low temperature (170 °C) crystallization of amorphous-Ge thin film on glass via Au induced layer exchange process in amorphous-Ge/GeOx/Au/glass stack and electrical characterization
    Singh, Ch Kishan
    Amaladass, E. P.
    Parida, P. K.
    Sain, T.
    Ilango, S.
    Dhara, Sandip
    APPLIED SURFACE SCIENCE, 2021, 541
  • [2] Crystallization kinetics and role of stress in Al induced layer exchange crystallization process of amorphous SiGe thin film on glass
    Sain, Twisha
    Singh, Ch Kishan
    Ilango, S.
    Mathews, T.
    JOURNAL OF APPLIED PHYSICS, 2019, 126 (12)
  • [3] Crystallization of Ge thin films by Au-induced layer exchange: effect of Au layer thickness on Ge crystal orientation
    Sunthornpan, Narin
    Kimura, Kenjiro
    Kyuno, Kentaro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2022, 61 (SB)
  • [4] Au induced crystallization and layer exchange in a-Si/Au thin film on glass below and above the eutectic temperature
    Singh, Ch. Kishan
    Tah, T.
    Madapu, K. K.
    Saravanan, K.
    Ilango, S.
    Dash, S.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2017, 460 : 130 - 135
  • [5] Low-temperature (330 °C) crystallization and dopant activation of Ge thin films via AgSb-induced layer exchange: Operation of an n-channel polycrystalline Ge thin-film transistor
    Suzuki, Tatsuya
    Joseph, Benedict Mutunga
    Fukai, Misato
    Kamiko, Masao
    Kyuno, Kentaro
    APPLIED PHYSICS EXPRESS, 2017, 10 (09)
  • [6] Low-temperature (330 °C) crystallization and dopant activation of Ge thin films via AgSb-induced layer exchange: Operation of an n-channel polycrystalline Ge thin-film transistor
    Suzuki, Tatsuya
    Joseph, Benedict Mutunga
    Fukai, Misato
    Kamiko, Masao
    Kyuno, Kentaro
    Applied Physics Express, 2017, 10 (09):