Fabrication of photonic structures by means of interference lithography and reactive ion etching

被引：15
|
作者：
Mikulskas, I
Mickevicius, J
Vaitkus, J
Tomasiunas, R
Grigaliunas, V
Kopustinskas, V
Meskinis, S
机构：
[1] Vilnius State Univ, Inst Mat Sci & Appl Res, LT-2040 Vilnius, Lithuania
[2] Inst Phys Elect, LT-3009 Kaunas, Lithuania
来源：
APPLIED SURFACE SCIENCE | 2002年 / 186卷 / 1-4期
关键词：
beam interference; triangular and square lattice; two-dimensional photonic crystals;
D O I：
10.1016/S0169-4332(01)00694-8
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
In this study, the fabrication of two-dimensional photonic structures by means of interference lithography is discussed. The proposed method provides flexible formation of various configuration two-dimensional interference patterns depending on the number of beams and their interorientation, Mainly, triangular and square lattice configurations are modeled. It is shown that C the dimensions of substructure increase with the number of beams superpositioning. Mask fabrication by SF6/N-2 reactive ion etching, while transferring the pattern onto silicon substrate is presented. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：599 / 603
页数：5
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