Investigation of the dynamic on-state resistance of AlGaN/GaN HEMTs

被引:5
|
作者
Rzin, M. [1 ]
Labat, N. [1 ]
Malbert, N. [1 ]
Curutchet, A. [1 ]
Brunel, L. [2 ]
Lambert, B. [2 ]
机构
[1] Univ Bordeaux, IMS Lab, Talence, France
[2] United Monolith Semicond, F-91140 Villebon Sur Yvette, France
关键词
GaN; HEMT; AlGaN/GaN; Dynamic resistance; RON; HTRB; Pulsed I-V;
D O I
10.1016/j.microrel.2015.07.001
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The dynamic on-state resistance (R-ON) increase in AlGaN/GaN high-electron-mobility transistors (HEMTs) has been investigated by pulsed I-V measurements on devices issued from UMS GaN technology. We have studied the influence of the measurement setup on the pulsed I-V measurements and highlighted the importance of the I-DS(t) waveforms to verify the validity of the measurements. The R-ON is not sensitive to short time transients below 10 mu s as well as for fresh and HTRB aged devices. The dynamic resistance (R-ON) is doubled in off-state conditions by increasing V-DS0 from 0 V to 50 V. The threshold voltage V-TH of aged devices has not shifted during the HTRB aging test carried out for 2200 h. Therefore, trapping effects responsible for the increase of R-ON are rather more located in the gate-source and drain-source access regions than under the gate. (C) 2015 Published by Elsevier Ltd.
引用
收藏
页码:1672 / 1676
页数:5
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