A MoM-based design and simulation method for an etched diffraction grating demultiplexer

被引：12
|
作者：
Song, J
Pang, DQ
He, SL [1 ]
机构：
[1] Zhejiang Univ, Joint Lab Opt Commun, State Key Lab Modern Opt Instrumentat, Ctr Opt & Electromagnet Res,Joint Res Ctr Photon, Hangzhou 310027, Peoples R China
[2] Royal Inst Technol, Alfven Lab, Div Electromagnet Theory, S-10044 Stockholm, Sweden
来源：
OPTICS COMMUNICATIONS | 2004年 / 233卷 / 4-6期
关键词：
demultiplexer; method of moment; etched diffraction grating; planar waveguide; spectral response; chromatic dispersion; polarization;
D O I：
10.1016/j.optcom.2004.01.067
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A design and simulation method based on the method of moment (MoM) is proposed for an etched diffraction grating (EDG) demultiplexer. The method of moment is used to calculate the surface current, which produces the diffracted field at the image plane, for both polarizations. The present method can be used to design and simulate effectively and accurately an EDG demultiplexer with required specifications (such as the chromatic dispersion and loss variation) for both polarizations and the polarization-dependent loss. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码：363 / 371
页数：9
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