An improvement of high voltage power supply for pseudospark discharge

被引：2
|
作者：
Wang, MC [1 ]
Park, GS [1 ]
机构：
[1] SHANGHAI INST OPT & FINE MECH,SHANGHAI 201800,PEOPLES R CHINA
来源：
INTERNATIONAL JOURNAL OF INFRARED AND MILLIMETER WAVES | 1997年 / 18卷 / 06期
基金：
中国国家自然科学基金;
关键词：
Beam source; High voltage; Pseudospark discharge;
D O I：
10.1007/BF02678226
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
An analysis of the high voltage power supply removing the Pulse Forming Line (PFL) is presented in this paper. This is an important improvement to make a desktop free electron laser with about one meter length instead of an original device length of 5.5 meters and to realize other applications of the new beam source of pseudospark discharge at high voltage of 200 kV and a current of 2 kA.
引用
收藏
页码：1187 / 1198
页数：12
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