Structural and dielectric properties of anodic oxide film on Nb-Ti alloy

被引：13
|
作者：
Semboshi, Satoshi [1 ]
Bando, Ko-ichi [1 ]
Ohtsu, Naofumi [2 ]
Shim, Yonggu [3 ]
Konno, Toyohiko J. [4 ]
机构：
[1] Osaka Prefecture Univ, Dept Mat Sci, Osaka 5998531, Japan
[2] Kitami Inst Technol, Instrumental Anal Ctr, Kitami, Hokkaido 0908507, Japan
[3] Osaka Prefecture Univ, Dept Phys & Elect, Osaka 5998531, Japan
[4] Tohoku Univ, Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808577, Japan
来源：
THIN SOLID FILMS | 2008年 / 516卷 / 23期
关键词：
Niobium; Capacitors; Anodic oxidation; Surface structure;
D O I：
10.1016/j.tsf.2008.06.039
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The structural and dielectric properties of anodic oxide films on Nb and Nb-Ti alloys containing 1,3,5,7,10 and 15 at.% Ti were investigated. Anodized Nb-Ti alloys were covered with an anodic oxide film containing amorphous and partly crystalline Nb(2)O(5) and TiO(2), Increase of the Ti content in the alloy resulted in the increase of the anodic oxide film thickness and the amount of TiO(2) in the oxide film, which led to an enhancement of the permittivity and a suppression of the leak current of the anodic oxide film. Therefore, both the capacitance and the leak current of anodized Nb-Ti alloys can be improved by controlling the composition of the alloy. (c) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码：8613 / 8619
页数：7
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