Adsorbate-induced step faceting of Cu(100) electrodes in HCl

被引:82
|
作者
Vogt, MR [1 ]
Moller, FA [1 ]
Schilz, CM [1 ]
Magnussen, OM [1 ]
Behm, RJ [1 ]
机构
[1] UNIV ULM, ABT OBERFLACHENCHEM & KATALYSE, D-89069 ULM, GERMANY
关键词
chloride; copper; faceting; scanning tunneling microscopy; solid-liquid interface;
D O I
10.1016/S0039-6028(96)01089-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In-situ scanning tunneling microscopy (STM) observations of structural changes on Cu(100) electrode surfaces in 1 mM HCl solution at potentials far below Cu bulk dissolution are presented. Upon increasing the potential above -0.4 V (versus Ag/AgCl) a transition from a (1 x 1) to a c(2 x 2) structure is observed, which is accompanied by a rearrangement of the substrate surface via a step faceting/defaceting mechanism. During the transition the steps change reversibly from a random orientation and frizzy appearance in the (1 x 1)regime to predominantly [010]- and [001]-oriented steps with strongly reduced mobility of Cu step atoms in the presence of the c(2 x 2) structure. Our observations show that the preferred step orientation in the c(2 x 2) regime corresponds to an adsorbate-induced equilibrium structure, and does not result from the kinetics of Cu dissolution as previously suggested. According to electrochemical measurements, the changes in Cl coverage accompanying the transition are negligible, indicating that the vastly different step structure and dynamics are caused solely by the potential-induced onset of order within the adlayer.
引用
收藏
页码:L33 / L41
页数:9
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