Current-voltage-time characteristics of the reactive Ar/O2 high power impulse magnetron sputtering discharge

被引：34
|
作者：
Magnus, Fridrik [1 ]
Tryggvason, Tryggvi K. [1 ]
Olafsson, Sveinn [1 ]
Gudmundsson, Jon T. [1 ,2 ]
机构：
[1] Univ Iceland, Inst Sci, IS-107 Reykjavik, Iceland
[2] Shanghai Jiao Tong Univ, Univ Michigan Shanghai Jiao Tong Univ Joint Inst, Shanghai 200240, Peoples R China
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2012年 / 30卷 / 05期
关键词：
PHYSICAL VAPOR-DEPOSITION; FILMS;
D O I：
10.1116/1.4732735
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The discharge current-voltage-time waveforms are studied in the reactive Ar/O-2 high power impulse magnetron sputtering discharge with a titanium target for 400 mu s long pulses. The discharge current waveform is highly dependent on both the pulse repetition frequency and discharge voltage and the current increases with decreasing frequency or voltage. The authors attribute this to an increase in the secondary electron emission yield during the self-sputtering phase of the pulse, as an oxide forms on the target. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.4732735]
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页数：4
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